Fpgas rely on the ubiquitous transistor - based technology called complementary metal oxide semiconductor ( cmos ) Fpga使用的材料是互补式金属氧化物半导体（ cmos ）技术，这是种随处可见的电晶体技术。
The entire process of building a sound chip is fully compatible with the standard industry process for semiconductor manufacturing , called complementary metal oxide semiconductor , or cmos 声音晶片的全部制程，是完全相容于互补式金属氧化物半导体（ cmos ）的工业标准制程。
The agreement includes complementary metal oxide semiconductor ( cmos ) and silicon - on - insulator ( soi ) technologies as well as advanced semiconductor research and design enablement transitioning at the 45 - nanometer generation 该协议包括互补金属氧化物半导体( cmos )以及绝缘硅片( soi )技术以及转向45纳米级别高端半导体的研究和设计。
Tio _ 2 has been known as an n - type metal oxide semiconductor and an important inorganic function material . it can be used in fabricating medium material , photocatalytic films , reducing reflect coat , gas sensor , etc . tio _ 2 films had excellent performance with photocatalysis , resisting photo erode , difficult dissolution in acidity condition , innocuity and stabilization in light and soon on Tio _ 2是n型金属氧化物半导体，是一种重要的无机功能材料，可用于制作电介质材料、光催化薄膜、减反射涂层、气敏传感器等。 tio _ 2薄膜具有优异的光催化性能，抗光腐蚀，在酸性条件下难溶，对光稳定，无毒等。
